Nilo alloy 42 is a high-performance iron-nickel-based precision alloy, also known as Invar 42.FeNi42, 4J42, Its main components include iron (Fe) and nickel (Ni). The nickel content is approximately 41.5% to 42.5%, with the remaining being iron.
The preparation process of Nilo alloy 42 alloy ...
Nickel-Iron-Vanadium alloy target is an important Magnetron sputtering coating material. NiFeV alloy target is mainly composed of nickel, iron, and vanadium elements in a certain proportion and prepared through special processes. The target features with high purity, good mechanical propertie...
High-purity aluminum targets are materials made of high-purity aluminum metal materials as the main component for sputtering coating and other processes,it is a functional film target materials The sputtering target usually referring to aluminum targets with purity of 99.99% (4N) and above, and u...
Zinc-copper alloy target is a sputtering coating material that plays an important role in the fields of material surface treatment and thin film preparation. It mainly consists of zinc (Zn) and copper (Cu). By precisely controlling the ratio of the two, zinc-copper alloy targets with different pr...
Sponge titanium is a metallic titanium in the shape of sponge, which is obtained by chlorinating rutile ore to generate titanium tetrachloride and then reducing it with active elements such as magnesium or sodium. It is commonly known as sponge titanium.
Sponge titanium American Standard (ASTM ...
Aluminum-silicon alloy target is an alloy material with aluminum and silicon as the main components, and the content ratio can be adjusted according to different application requirements. Aluminum-silicon sputtering target has good thermal conductivity, corrosion resistance, moderate strength and...
F22 is a commonly used alloy steel in the industrial field. It is also known as UNS K21590, 2¼Cr – 1Mo steel, SA182 F22, Chrome Moly F22, Alloy F22, etc.F22 materials contains elements such as iron, chromium and molybdenum, and has good strength standards and specifications. It is made thro...
Molybdenum sputtering target is a material used in Physical Vapor Deposition (PVD) technology. During the sputtering process, high-energy particles (such as argon ions) bombard the surface of the molybdenum target, causing molybdenum atoms to be sputtered out and deposited on the substrate materi...
Expansion alloy is a kind of alloy with special thermal expansion properties. In a certain temperature range, Dilatant alloy materials coefficient of thermal expansion (CTE) either remains extremely low (low expansion alloys), or can match the coefficient of thermal expansion of other materials (...
Nickel-iron-molybdenum alloy target is a kind of alloy target composed of nickel (Ni), iron (Fe), molybdenum (Mo) three metal elements in accordance with a certain proportion, mainly used in thin film deposition technology, by sputtering and other methods in variousmatrix materials to prepare nic...
Elastic alloy is a kind of alloy material with special elastic properties. When subjected to external forces, it can produce large elastic deformations and quickly return to its original state after the removal of the external forces. The amount of deformation has a linear relationship with the a...
Aluminum-tin-copper alloy target is a multicomponent alloy made of aluminum, tin and copper fused in a specific ratio. AlSnCu thin film coating target has the advantages of all three elements, moderate hardness, good wear resistance, and good corrosion resistance. Aluminum Tin copper sputtering t...