Elastic alloy is a kind of alloy material with special elastic properties. When subjected to external forces, it can produce large elastic deformations and quickly return to its original state after the removal of the external forces. The amount of deformation has a linear relationship with the a...
Aluminum-tin-copper alloy target is a multicomponent alloy made of aluminum, tin and copper fused in a specific ratio. AlSnCu thin film coating target has the advantages of all three elements, moderate hardness, good wear resistance, and good corrosion resistance. Aluminum Tin copper sputtering t...
Titanium is a chemical element with an atomic number of 22 that is classified as a transition metal on the periodic table. Titanium alloy is an alloy composed of titanium (Ti) as a base and other elements. In titanium alloys, in addition to titanium itself, other alloying elements such as aluminu...
Molybdenum disilicide (MoSi2) is a kind of inorganic compound, which has the dual characteristics of metal and ceramic, and is a high temperature material with excellent performance. MoSi2 target is Metallic gray, tetragonal crystal structure with metallic luster. SiMo2 materials with high-meltin...
Sputtering targets can be divided into metal targets, alloy targets, and ceramic targets according to the material. today,Today, i will take you to understand the metal target.
Metal targets are vital materials in modern industry and are widely used in many fields. Metal target is usually used a...
There are various methods for preparing thin films. There are mainly physical vapor deposition (PVD) chemical vapor deposition (CVD), and sol-gel method and electroplating method in chemical solution coating are also more common.Next, we mainly talk about pvd coating and cvd coating.
PVD (Physica...
Chromium-tungsten alloy pvd target is made of chromium and tungsten two kinds of metal alloy material, with high temperature strength, corrosion resistance, high hardness characteristics, widely used in machining, aerospace and other fields.
Chromium-tungsten alloy thin film coating materials ...
CoMn alloy target is a kind of material used in magnetron sputtering technology, mainly used for the preparation of thin films material and coatings. Its composition mainly includes cobalt (Co) and manganese (Mn), and the specific composition ratio can be adjusted according to demand. This all...
In manufacturing, aluminum is one of the most popular and widely used metals. Al with light weight, strength to weight ratio is quite considerable, so it is favored characteristics. In order to meet the diverse needs of different industrial sectors, aluminum is combined with other elements to fo...
Cobalt sputtering target is made of high purity cobalt. Co metal target with Excellent magnetic properties, such as high saturation magnetization. Cobalt sputtering target production process covers powder metallurgy or melting casting, which is made by multiple processes. Co target plays a signi...
Permalloy is an alloy mainly composed of nickel and iron, the nickel content is mostly between 35% and 90%, often containing a small amount of molybdenum, copper and other elements. It has high permeability, low coercivity and good rectangular hysteresis loop characteristics, and is widely used i...
Silicon sputtering target is made of high purity silicon for sputtering coating process raw materials, silicon sputtering target has high purity characteristics, purity can reach 99.999% and above. The physical properties are stable, the density is about 2.33g/cm³, the melting point is about 1414...