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High purity Nickel (Ni) and Nickel alloy target for pvd coating
In the field of modern materials science and technology, nickel and nickel alloy targets, as high-purity materials used in thin film preparation processes such as physical vapor deposition (PVD) and chemical vapor deposition (CVD), are playing a pivotal role. Through methods like sputtering or e...Read more -
Chromium (Cr) Target and Chromium alloy target
In the era of booming high-tech industries, chromium targets are playing an increasingly vital role as a key precision manufacturing material. From smartphones to tablets, and from solar cells to semiconductor chips, chromium targets are ubiquitous, quietly driving technological advancements and ...Read more -
Nilo alloy 42 Expansion alloy (FeNi42) Alloy Material Precision alloy material
Nilo alloy 42 is a high-performance iron-nickel-based precision alloy, also known as Invar 42.FeNi42, 4J42, Its main components include iron (Fe) and nickel (Ni). The nickel content is approximately 41.5% to 42.5%, with the remaining being iron. The preparation process of Nilo alloy 42 alloy ...Read more -
Nickel Iron Vanadium (NiFeV) alloy target
Nickel-Iron-Vanadium alloy target is an important Magnetron sputtering coating material. NiFeV alloy target is mainly composed of nickel, iron, and vanadium elements in a certain proportion and prepared through special processes. The target features with high purity, good mechanical propertie...Read more -
High Purity Aluminum (Al) Target
High-purity aluminum targets are materials made of high-purity aluminum metal materials as the main component for sputtering coating and other processes,it is a functional film target materials The sputtering target usually referring to aluminum targets with purity of 99.99% (4N) and above, and u...Read more -
Zinc copper (ZnCu）alloy target
Zinc-copper alloy target is a sputtering coating material that plays an important role in the fields of material surface treatment and thin film preparation. It mainly consists of zinc (Zn) and copper (Cu). By precisely controlling the ratio of the two, zinc-copper alloy targets with different pr...Read more -
Sponge titanium high purtiy raw materials
Sponge titanium is a metallic titanium in the shape of sponge, which is obtained by chlorinating rutile ore to generate titanium tetrachloride and then reducing it with active elements such as magnesium or sodium. It is commonly known as sponge titanium. Sponge titanium American Standard (ASTM ...Read more -
Aluminum silicon(AlSi) alloy target
Aluminum-silicon alloy target is an alloy material with aluminum and silicon as the main components, and the content ratio can be adjusted according to different application requirements. Aluminum-silicon sputtering target has good thermal conductivity, corrosion resistance, moderate strength and...Read more -
ASTM A182 F22 Chrome Moly Alloy materials
F22 is a commonly used alloy steel in the industrial field. It is also known as UNS K21590, 2¼Cr – 1Mo steel, SA182 F22, Chrome Moly F22, Alloy F22, etc.F22 materials contains elements such as iron, chromium and molybdenum, and has good strength standards and specifications. It is made thro...Read more -
Molybdenum （Mo）sputtering target
Molybdenum sputtering target is a material used in Physical Vapor Deposition (PVD) technology. During the sputtering process, high-energy particles (such as argon ions) bombard the surface of the molybdenum target, causing molybdenum atoms to be sputtered out and deposited on the substrate materi...Read more -
Expansion alloy materials
Expansion alloy is a kind of alloy with special thermal expansion properties. In a certain temperature range, Dilatant alloy materials coefficient of thermal expansion (CTE) either remains extremely low (low expansion alloys), or can match the coefficient of thermal expansion of other materials (...Read more -
Nickel iron molybdenum alloy target（NiFeMo）Permalloy 80
Nickel-iron-molybdenum alloy target is a kind of alloy target composed of nickel (Ni), iron (Fe), molybdenum (Mo) three metal elements in accordance with a certain proportion, mainly used in thin film deposition technology, by sputtering and other methods in variousmatrix materials to prepare nic...Read more