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What fields are sputtering targets used in

We all know that there are many specifications of sputtering target, which has a wide range of application.The target varieties commonly used in different industries are also different, today let’s come with Beijing Richmat together to learn about the sputtering target industry classification. 

https://www.rsmtarget.com/

一、Definition of sputtering target material

    Sputtering is one of the main technologies for preparing thin film materials. It uses the ions generated by ion source to form ion beam with high velocity energy through accelerated aggregation in vacuum.Bombarded solid surface, ions and solid surface atoms have kinetic energy exchange, so that the atoms on the solid surface leave the solid and deposit on the substrate surface, the bombarded solid is the raw material for preparing the sputtering deposited film, known as the sputtering target.

二、Application field classification of sputtering target materials

  1Semiconductor target

         (1)Commonly used material:Common targets in this field include tantalum, copper, titanium, aluminum, gold, nickel and other high melting point metals.

  (2)UsageBasically use at the crucial original data of integrated circuit

  (3)Functional requirementsThe technical requirements on purity, size, integration are high.

  2、Target material for planar display

  (1)Commonly used materialTargets commonly used in this field include aluminum/copper/molybdenum/nickel/niobium/silicon/chromium, etc.

  (2)UsageThis kind of target material is mainly used in various types of large area film of TV and notebook

  (3)Functional requirementsHigh requirements on purity, large area, uniformity and so on.

  3Targets for solar cells

         (1)Commonly used materialAluminum/copper/Molybdenum/chromium /ITO/Ta targets are commonly used in solar cells.

  (2)UsageMainly used in “window layer”, barrier layer, electrode and conductive film and other occasions

  (3)Functional requirementsHigh skill requirement, wide range of use.

  4Target material for information storage

  (1)Commonly used materialInformation storage commonly used cobalt/nickel/ferroalloy/chromium/tellurium/selenium target materials.

  (2)UsageThe target material here is mainly used for the head, middle layer and bottom layer of the cd-rom and CD.

  (3)Functional requirementsHigh storage density and high transmission speed are required.

  5Target material for tool modification

          (1)Commonly used materialTool modification of titanium/zirconium/lattice/chrome-aluminum alloy and other targets.

  (2)Usage:It is usually used for appearance enhancement.

  (3)Functional requirementsHigh functional requirements, long service life.

  6Target materials for electronic devices

   (1)Commonly used material:Aluminum alloy/silicide targets are commonly used in electronic devices

   (2)UsageGenerally used for film resistors and capacitors.

  (3)Functional requirementsSmall size, stability, low resistance temperature coefficient


Post time: Apr-21-2022