Titanium sputtering targets are critical materials in physical vapor deposition (PVD) technology, widely used in semiconductors, tool coatings, optical films, and biomedical applications. This article provides an in-depth analysis of titanium targets, covering their properties, applications, manufacturing processes, and market trends to help you fully understand this high-end material.
1. Properties and Advantages of Titanium Sputtering Targets
(1) Physical and Chemical Properties
- High melting point (1668°C): Suitable for high-temperature sputtering processes
- Excellent corrosion resistance: TiO₂ passivation layer resists acids, alkalis, and salt spray
- Good biocompatibility: Non-toxic and non-rejecting for medical implants
- High hardness : Ideal for wear-resistant coatings
(2) Thin Film Performance Advantages
| Film Type | Properties | Typical Applications |
|---|---|---|
| Pure Ti Film | Strong adhesion, corrosion-resistant | Biomedical implants, anti-corrosion coatings |
| Titanium Nitride (TiN) | High hardness, gold color | Tool coatings, decorative films |
| Titanium Dioxide (TiO₂) | High refractive index, photocatalytic | Optical lenses, self-cleaning glass |
Key Applications of Titanium Sputtering Targets:
(1) Semiconductors & Microelectronics Copper diffusion barrier (Ti/TiN) Contact layer (TiSi₂) for reduced resistance Electrode material (TiN) for memory devices
(2) Tool & Mechanical Coatings Cutting tools (TiAlN coating, ) Injection molds (TiCN coating reduces sticking)
(3) Optical Coatings Anti-reflective/reflective films (TiO₂/SiO₂ multilayer design) Display panels (ITO adhesion layer)
(4) Biomedical Applications Orthopedic implants (TiO₂ coating promotes osseointegration) Dental implants (antibacterial Ti coating)
(5) Corrosion-Resistant Engineering Chemical equipment (acid/alkali-resistant coatings) Marine components (seawater corrosion resistance)
Key Considerations When Using Titanium Sputtering Targets:
(1) Purity Control Semiconductor grade: ≥99.995%. Industrial grade: ≥99.9%
(2) Sputtering Process Optimization
Power supply: Mid-frequency or pulsed DC
Gas ratio:Pure Ti film TiN film
(3) Target Maintenance Regular polishing:
Prevents nodule formation Cooling system: Water temperature <25°C
(4) Safety & Environmental Protection Titanium powder is flammable: Store under nitrogen Waste target recycling: HF-HNO₃ dissolution treatment
Market Trends for Titanium Sputtering Targets:
Growing semiconductor demand: High-purity Ti targets for sub-5nm processes
Green manufacturing: Recycling efficiency up to 95%
How to Choose the Right Titanium Sputtering Target?
| Application | Recommended Ti Target |
|---|---|
| Semiconductors | 6N high-purity Ti + nitriding |
| Tool coatings | TiAl alloy target |
| Biomedical | Medical-grade pure Ti target |
Titanium sputtering targets play a vital role in high-end manufacturing due to their superior performance. With advancements in semiconductors, renewable energy, and medical technology, the demand for high-purity, high-performance titanium targets will continue to rise. Selecting the right titanium target requires careful consideration of purity, bonding method, and application requirements.
Post time: Oct-08-2025