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Sputtering target – nickel chromium target

  Target is the key basic material for the preparation of thin films. At present, the commonly used target preparation and processing methods mainly include powder metallurgy technology and traditional alloy smelting technology, while we adopt the more technical and relatively new vacuum smelting technology.

  The preparation of nickel-chromium target material is to select nickel and chromium of different purity as raw materials according to the different purity requirements of customers, and use vacuum induction smelting furnace for smelting. The smelting process generally includes vacuum extraction in the smelting chamber – argon gas washing furnace – vacuum extraction – inert gas protection – smelting alloying – refining – casting – cooling and demoulding.

  We will test the composition of the cast ingots, and the ingots that meet the requirements will be processed in the next step. Then the nickel-chromium ingot is forged and rolled to obtain a more uniform rolled plate, and then the rolled plate is machined according to the customer’s requirements to obtain the nickel-chromium target meeting the customer’s requirements.


Post time: Feb-01-2023