News - Nickel Iron Vanadium (NiFeV) alloy target

Nickel-Iron-Vanadium alloy target is an important Magnetron sputtering coating material. NiFeV alloy target is mainly composed of nickel, iron, and vanadium elements in a certain proportion and prepared through special processes. The target features with high purity, good mechanical properties, excellent magnetic properties, thermal stability, and corrosion resistance. It is widely used in various fields such as the electronics and information industry, semiconductor industry, magnetic materials, solar cells, and flat panel displays.

https://www.rsmtarget.com/nife-sputtering-target-high-purity-thin-film-pvd-coating-custom-made-product

Nickel-iron-vanadium alloy targets are mainly produced by vacuum melting method, which consists of the following steps:

1.Raw material preparation: Select high – purity nickel, iron, and vanadium metal raw materials. Precisely calculate the amount of each metal raw material according to the required composition ratio of the nickel – iron – vanadium alloy target, and then pre – treat the raw materials.

2.Melting: Load the pre – treated nickel, iron, and vanadium raw materials into the melting furnace in the calculated proportion. Melting is carried out in a vacuum or under an inert gas protection atmosphere to prevent metal oxidation. By controlling parameters such as melting temperature, time, and power, the metal raw materials are fully melted and evenly mixed. During the melting process, refining operations are required to further remove impurities and gases.

3.Ingot forming: According to the required shape and size of the target, slowly pour the melted nickel – iron – vanadium alloy liquid into the pre – heated mold. Under the action of gravity, the alloy liquid fills the mold cavity. During the pouring process, the pouring speed and temperature should be well – controlled to avoid defects such as short – pouring and porosity. The alloy liquid solidifies in the mold through natural cooling or forced cooling to form a nickel – iron – vanadium alloy ingot.

4.Processing: Conduct machining, heat treatment, and surface treatment according to the required shape and size.

5. Nickel iron vanadium alloy coating materials with composition testing and NiFeV target packaging.

Performance Characteristics of Nickel – Iron – Vanadium Alloy

1 The sputttering target with high Purity: The purity of raw materials is usually required to be greater than 99.99%. This can effectively reduce the introduction of impurities, ensuring that the deposited thin films during the sputtering process possess excellent properties, such as high electrical conductivity and high magnetic properties.

2.The nickel alloy metal sputtering target has good mechanical properties: It has relatively high strength and hardness. This enables the target to withstand certain impact forces and frictional forces during use, making it less likely to deform or be damaged. Meanwhile, it also has a certain degree of toughness and ductility, facilitating processing into various shapes and sizes to meet the requirements of different application scenarios.

3.The nifev functional film target material with excellent magnetic properties: Both nickel and iron are magnetic metal elements. The addition of vanadium can further adjust the magnetism of the alloy, enabling it to exhibit a high magnetic permeability even in a weak magnetic field. It can be used to prepare thin – film materials with special magnetic property requirements.

4.The sputtering target coating material with good Thermal Stability: The alloy has a high melting point and thermal conductivity. During the high – temperature sputtering process, it can maintain stable performance and is less prone to phenomena such as deformation, melting, or evaporation.

5.Magnetron sputtering NiFeV target with excellent Corrosion Resistance: The addition of vanadium significantly enhances the corrosion resistance of the alloy.

Nickel – iron – vanadium alloy targets have a wide range of applications. In the electronic information field, they are used in hard disk storage and chip manufacturing. In the flat – panel display field, they help prepare electrodes for TFT arrays and transparent conductive films. In the solar cell field, they can be used as electrodes and back – contact layers. In the sensor field, they can be used to fabricate key components of magnetic sensors and pressure sensors.

Post time: Feb-13-2025