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Main application fields of high purity copper target

  In what fields are high purity copper targets mainly used? On this issue, let editor from RSM to introduce the application field of high purity copper target through the following points .

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  High purity copper targets are mainly used in electronics and information industry, such as integrated circuits, information storage, LIQUID crystal display, laser memory, electronic control devices, etc. Can be used in glass coating field; It can also be used in wear-resistant materials, high temperature corrosion resistance, high-grade decorative products and other industries.

  Information storage industry: With the continuous development of information and computer technology, the demand for recording media is increasing in the international market, and the corresponding target material market for recording media is also expanding, its related products are hard disk, magnetic head, optical disc (CD-ROM, CD-R, DVD-R, etc.), magneto-optical phase change optical disc (MO, CD-RW, DVD-RAM).

  Integrated circuit industry: in the field of semiconductor application, target is one of the main components of the international target market, mainly used for electrode interconnect film, barrier film, contact film, optical disc mask, capacitor electrode film, resistance film and other aspects.

  Flat display industry: flat display includes liquid crystal display (LCD), plasma display (PDP) and so on. Currently, liquid crystal display (LCD) dominates the flat panel display market, accounting for more than 85% of the market. It is considered to be the most promising flat panel display device, widely used in laptop computer monitors, desktop computer monitors and high-definition TELEVISIONS. LCD manufacturing process is complex, in which the reduced reflective layer, transparent electrode, emitter and cathode are formed by sputtering method, therefore, in the LCD industry, sputtering target plays an important role.

  High purity copper target is widely used in the above fields, and higher and higher requirements are put forward for the quality of sputtering targets .


Post time: Jul-07-2022