Iron sputtering target is a target with iron as its main component. Fe target can be prepared by methods such as melting casting or powder metallurgy. Fe sputtering target has the characteristics of high purity, good electrical and thermal conductivity, and strong machinability. In the electronics industry, Fe pvd target is used to manufacture magnetic films, and in the decoration industry, it is used to form decorative films, which can change the performance of lenses in the optical field.
The commonly used melting methods are vacuum induction melting, vacuum arc melting and vacuum electron bombardment melting. Vacuum induction melting is a process of melting and alloying metals by eddy current generated by electromagnetic induction under vacuum conditions, which has the advantages of high melting temperature, uniform alloy composition and less inclusions. Vacuum arc melting is a process in which metal is heated to melting state by arc discharge under vacuum condition. It has the advantages of fast melting speed, high energy density and high melting point metal. Vacuum electron bombardment smelting is a process in which metal is melted and alloyed by electron beam bombardment under vacuum conditions. It has the advantages of high melting temperature, concentrated energy density and the melting process.
Powder mixing: iron powder and other additives (such as lubricants, binders, etc.) are mixed evenly according to a certain proportion.
Press molding: The mixed powder is put into the mold and a certain pressure is applied through the press to form it into the desired shape and size.
Sintering: The pressed body is put into the sintering furnace and sintered at high temperature. In the sintering process, diffusion and fusion occur between powder particles, which increases the density and strength of the billet.
Post-treatment: Post-treatment of the sintered iron target, such as processing, heat treatment, surface treatment, etc., to improve its performance and quality.
Post time: Dec-05-2024