About the target product, now the application market is more and more wide, but there are still some users is not very understand about the use of the target, let experts from RSM technology Department to make a detailed introduction about it,
1. Microelectronics
In all application industries, the semiconductor industry has the most demanding requirements for target sputtering film quality. Silicon wafers of 12 inch (300 epistaxis) have now been manufactured. The width of the interconnect is decreasing. Silicon wafer manufacturers require large size, high purity, low segregation and fine grain of the target, which requires better microstructure of the manufactured target.
2, display
Flat panel display (FPD) has greatly impacted the cathode-ray tube (CRT) -based computer monitor and television market over the years, and will also drive the technology and market demand for ITO target materials. There are two kinds of iTO targets. One is to use nanometer state of indium oxide and tin oxide powder after sintering, the other is to use indium tin alloy target.
3. Storage
In terms of storage technology, the development of high-density and large-capacity hard disks requires a large number of giant reluctance film materials. The CoF~Cu multilayer composite film is a widely used structure of giant reluctance film. The TbFeCo alloy target material needed for magnetic disc is still in further development. The magnetic disc manufactured with TbFeCo has the characteristics of large storage capacity, long service life and repeated non-contact erasability.
Development of target material:
Various types of sputtering thin film materials have been widely used in semiconductor integrated circuits (VLSI), optical disks, planar displays and surface coatings of workpiece. Since THE 1990s, the synchronous development of sputtering target material and sputtering technology has greatly met the needs of the development of various new electronic components.
Post time: Aug-08-2022