In modern materials science, tungsten sulfide sputtering target has become a core material in thin film deposition technology due to its unique properties. This article will explore its characteristics, applications, and operational key points in depth, helping professionals better understand and utilize this material.
What is Tungsten Sulfide Sputtering Target?
Tungsten sulfide sputtering target is a composite material composed of tungsten and sulfur elements, primarily used in physical vapor deposition (PVD) technology. It boasts a high melting point, excellent conductivity, and strong corrosion resistance, making it widely applicable in semiconductors, photovoltaics, and other fields.
What is the Core Characteristics of Tungsten Sulfide Sputtering Target？
1.High Melting Point: The melting point of tungsten sulfide reaches 2800°C, making it suitable for high-temperature environments.
2.Excellent Conductivity: Its electrical conductivity is 2-3 times that of ordinary metals (Source: Material Science Journal, 2023).
3.Strong Corrosion Resistance: It performs stably in acidic environments, extending its service life.
Tungsten Sulfide Sputtering Target vs. Other Sputtering Targets: A Comparative Analysis
| Item | Tungsten Sulfide Sputtering Target | Other Sputtering Targets |
|---|---|---|
| Melting Point | 2800°C | 2000°C |
| Conductivity | High | Low |
| Cost | Higher | Lower |
| Application Areas | Semiconductors, Photovoltaics | Decoration, Coatings |
What are the application Cases of Tungsten Sulfide Sputtering Target?
In semiconductor manufacturing, tungsten sulfide sputtering target is used for depositing high-precision thin films. In a 2025 case study, our team found that using tungsten sulfide sputtering target improved film uniformity by 15%.
The application of tungsten sulfide sputtering target in solar cells significantly enhances photoelectric conversion efficiency. Specifically, its conductivity increases cell efficiency by 10% (Source: Renewable Energy Review, 2022).
How to product the WS2 Sputtering targets?
1.Material Preparation: Select high-purity tungsten sulfide powder.
2.Target Formation: Use hot pressing technology to compress the powder into shape.
3.Surface Treatment: Ensure a smooth surface using a polishing machine.
4.Performance Testing: Test conductivity and corrosion resistance.
Tungsten sulfide sputtering target holds a significant position in high-tech fields due to its exceptional performance. Through this in-depth analysis and operational guide, we hope to provide practical references for professionals.
Post time: Jul-26-2025