News - High Purity Aluminum (Al) Target

High-purity aluminum targets are materials made of high-purity aluminum metal materials as the main component for sputtering coating and other processes,it is a functional film target materials The sputtering target usually referring to aluminum targets with purity of 99.99% (4N) and above, and ultra-high-purity aluminum sputtering targets with purity of 99.9995% (5N5) or even 99.9999% (6N).The aluminum target can be made Aluminum tube target, Aluminum Plannar target, Aluminum rod target, Aluminum sheet target and customized shape.High purity aluminum targets are mainly produced by smelting.

High purity aluminum target has high purity, good electrical conductivity, thermal conductivity, low melting point and good ductility and other performance characteristics, as follows:

1. Al target material with high purity: the impurity content is very low, which can form a high-quality and low-defect film during the coating process, reduce the influence of impurities on the film performance, and improve the conductivity, adhesion and corrosion resistance of the film.

2. Al metal target with good electrical conductivity and thermal conductivity, aluminum itself is a good conductor of electricity and heat, high purity aluminum target material can well and heat conduction current, to achieve stability in the process of sputtering power transmission and temperature control.

3. Aluminum sputtering target with uniform density distribution: after precision machining, uniform density, help to achieve stability in the process of sputtering deposition rate and uniform film thickness, to improve the quality of thin film.

4. Al metal material with a lower melting point: the melting point of aluminum is relatively low, about 660 ℃, in the process of sputtering and evaporation is easier to translate into gas or plasma, easy to form a thin film is deposited on the base.

5. Aluminum thin film mateiral with good conductility: easy to carry on processing operation such as forging, rolling, can be made into various shapes and sizes of the target material, meet the needs of different coating equipment and process.

The preparation method of high purity aluminum target material:

1. raw materials preparation: Select the raw material corresponding to the target and weigh it accurately.

2.The high purity aluminum smelting and casting billet shape. The temperature and cooling rate should be controlled during the melting and casting process to avoid coarse grains and internal defects.

3.Through the multidirectional forging and hot rolling process, refine grain and improve the uniformity of the material.After forging, intermediate annealing and recrystallization annealing are required to eliminate the internal stress and optimize the grain structure.

4.By static pressure and rolling process to further improve the density of the target material, surface quality and ensure the sputtering film uniformity and stability. The target material surface precision machining and polishing, to ensure the smoothness and finish.

5.Finally, the grain size, orientation and purity of the target were evaluated by X-ray diffraction (XRD) and scanning electron microscopy (SEM).

High purity aluminum usage and application fields of target material

1. High purity aluminum target material in the manufacture of integrated circuit (IC) was used to prepare metal interconnect, contact layer and barrier films. With the reduction of technical nodes, the purity, grain size and uniformity of aluminum targets are increasingly required to meet the needs of high-performance chips.

2. In the liquid crystal display (LCD) and organic light emitting diode (OLED) manufacturing, high purity aluminum target material used for the preparation of conductive layer and the reflector, improve the display brightness and contrast.

3. High purity aluminum sputtering target material can be used for solar cells on the back electrode layer, improve the photoelectric conversion efficiency and stability.

4. In optical devices, high purity aluminum coating material used for the preparation of high reflectivity film, widely used in laser, lens and optical sensors, and other fields.

High purity aluminum target is a key material used in physical vapor deposition (PVD) process, mainly used in the manufacture of thin film deposition materials. Al target is an indispensable key material for integrated circuits, flat panel displays, solar cells and other fields. Its preparation process is complex, involving raw material purification, melting casting, forging, heat treatment and surface treatment. Target purity, size, and shape are customized to meet product application needs.

Post time: Feb-07-2025