Comprehensive Analysis of Iron-Nickel-Chromium Sputtering Targets

An iron-nickel-chromium sputtering target (Fe-Ni-Cr Sputtering Target) is a high-purity alloy material used in physical vapor deposition (PVD), composed of iron (Fe), nickel (Ni), and chromium (Cr) in specific ratios.

For example, in the semiconductor industry, iron-nickel-chromium sputtering targets are commonly used to create corrosion-resistant conductive layers, while tool coatings rely on their high hardness.

However, it’s worth noting that different Fe-Ni-Cr ratios affect the target’s magnetic properties, temperature resistance, and sputtering efficiency.

Iron-Nickel-Chromium Sputtering Target vs. Other Targets: Comparative Analysis

Interestingly, while pure chromium targets are cheaper, iron-nickel-chromium sputtering targets are preferred in high-end coating applications due to their balanced performance.

 Top 5 Core Applications of Iron-Nickel-Chromium Sputtering Targets

1.Electronics Industry (e.g., chip conductive layers)

2.Tool Coatings (enhancing wear resistance)

3.Anti-Corrosion Coatings (chemical equipment protection)

4.Optical Thin Films (reflective/anti-reflective layers)

5.New Energy (fuel cell bipolar plates)

Common Misconceptions & Solutions：

❌ Myth 1: Higher Cr = Better Corrosion Resistance

• Fact: Cr >25% may weaken film adhesion.

❌ Myth 2: Using Unbonded Targets Directly

• Solution: Always use a copper backing plate to prevent cracking.

According to Journal of Vacuum Science & Technology (2022), optimizing Ni content (10-15%) balances cost and performance.

Purchasing Checklist (Checklist)：

 1. Purity

2.Composition ratio

3.Size

4.Compatibility Matches your PVD equipment

As a multi-component alloy sputtering target with excellent mechanical properties, corrosion resistance, and stable magnetic properties, the iron-nickel-chromium target holds an important position in the modern industrial field. By precisely adjusting the proportion of iron, nickel, and chromium, it can achieve customized optimization of the target’s electrical conductivity, melting point, and sputtering rate. It can not only adapt to high-power sputtering environments by virtue of its good high-temperature stability but also enhance the corrosion resistance of the thin film through the passivation effect of chromium. Nickel effectively improves the toughness and processing performance of the alloy, and the synergistic effect of the three elements endows the target with excellent comprehensive adaptability. In terms of application scenarios, it is widely used in the preparation of hard protective coatings, magnetic functional films, and coatings for precision electronic components. Especially in fields with strict requirements on material performance such as semiconductor manufacturing, medical devices, and aerospace, it has become one of the key materials to ensure product reliability and high-end quality due to its stable sputtering effect and thin film formation quality, promoting the development of related industries towards a more precise and durable direction.