Chromium (Cr) sputtering targets are high-purity materials widely used in physical vapor deposition (PVD) technology to deposit high-performance chromium thin films on substrates. Chromium exhibits a silvery-white metallic luster, with high-purity chromium demonstrating good ductility, while chromium containing impurities tends to be hard and brittle. Chromium offers excellent corrosion resistance, oxidizing very slowly even at high temperatures, and is insoluble in water but soluble in strong alkaline solutions. These superior physical and chemical properties make chromium a critical material in industries such as tooling, decorative coatings, microelectronics, and automotive components.
Specification of Chromium Targets
|
ITEM Purity(%) |
Impurity（≤ppm） |
|||||
|
Fe |
Al |
Si |
C |
S |
O |
|
|
99.50 |
1500 |
800 |
1000 |
150 |
100 |
1500 |
|
99.70 |
1200 |
600 |
1000 |
100 |
50 |
1000 |
|
99.80 |
2000 |
50 |
100 |
200 |
100 |
800 |
|
99.80 |
900 |
200 |
300 |
100 |
50 |
800 |
|
99.90 |
1000 |
100 |
150 |
100 |
100 |
1000 |
|
99.90 |
500 |
80 |
100 |
100 |
50 |
500 |
|
99.95 |
200 |
50 |
80 |
80 |
100 |
500 |
|
99.99 |
100 |
20 |
50 |
80 |
100 |
200 |
Manufacturing Process of Chromium Sputtering Targets
Our company employs powder metallurgy to produce high-purity chromium sputtering targets. By optimizing chromium powder purity, particle size, and production techniques, we ensure the targets achieve high density, low gas content, and minimal impurities. The key production steps include:
1.Raw Material Selection: Chromium powders of varying purity (e.g., 99.9%, 99.99%, or higher) and particle sizes are selected to meet different application requirements.
2.Mixing and Loading: Chromium powders are uniformly mixed to ensure compositional consistency and loaded into molds.
3.Degassing: Degassing is performed under vacuum or inert gas to reduce oxygen, nitrogen, and other impurities.
4.Hot Isostatic Pressing (HIP): Sintering under high temperature and pressure ensures densification, achieving a target density of ≥98% of theoretical density.
Compared to traditional melting-casting and rolling methods, powder metallurgy offers better control over microstructure, minimizing grain coarseness and porosity, making it ideal for high-precision coating applications.
Product Forms of Chromium Sputtering Targets:
We provide chromium targets in various configurations to meet customer needs, including:
Planar Targets: Suitable for large-area uniform coatings, such as architectural glass and decorative films.
Rotary Targets: Used in rotating target sputtering systems to improve material utilization.
Custom-Shaped Targets: Tailored designs for specialized coating requirements.
Additionally, we can optimize the microstructure (e.g., grain size, texture) of chromium targets to adapt to different sputtering conditions (e.g., DC magnetron sputtering, RF sputtering), ensuring film uniformity and adhesion.
Applications of Chromium Sputtering Targets:
Chromium thin films are widely used across industries due to their excellent hardness, corrosion resistance, and conductivity:
1. Tool and Mold Coatings Applied to cutting tools and molds as chromium or CrN (chromium nitride) coatings to enhance wear resistance and service life.
2. Decorative Coatings Used in automotive parts, household appliances, and sanitary ware to improve aesthetics and corrosion resistance.
3. Microelectronics and Semiconductors Serves as a barrier or conductive layer in integrated circuits, requiring ultra-high-purity chromium targets (≥99.995%).
4. Optics and Display Industry Used as reflective or conductive layers in architectural glass and flat-panel displays (e.g., OLED).
5. Magnetic Recording and Automotive Industry Functional coatings for hard disk storage media and automotive components.
Why Choose Our Chromium Sputtering Targets?
High Purity: Available in 99.9% to 99.995% purity to meet diverse industry needs.
High Density: HIP technology ensures low porosity, minimizing particle ejection during sputtering.
Customization: Planar, rotary, and custom-shaped targets with optimized microstructure.
Strict Quality Control: Ultrasonic testing, composition analysis (GDMS), and other inspections ensure product reliability.
Chromium sputtering targets play a vital role in PVD coating applications due to their outstanding properties. Utilizing advanced powder metallurgy, we produce high-purity, high-density chromium targets tailored for tooling, decorative, microelectronics, and optoelectronic industries. For customized solutions, contact us for detailed specifications and samples.
Post time: Sep-15-2025