Chromium aluminum (CrAl) sputtering targets serve as critical raw materials in physical vapor deposition (PVD) processes, playing an irreplaceable role in the surface treatment of industrial tools and molds. These high-performance targets, through precise control of chromium and aluminum ratios combined with advanced powder metallurgy manufacturing processes, provide exceptional surface protection solutions for various cutting tools, molds, and mechanical components.
Powder Metallurgy Process: The Core of High-Quality CrAl Target Manufacturing
Raw Material Selection and Ratio Optimization
We carefully select high-purity chromium (Cr), aluminum (Al) metal powders, and pre-alloyed CrAl powders as base materials. Through scientific proportion design, we ensure the final targets possess ideal chemical composition and phase structure, forming the foundation for high-performance coatings.
Precision Mixing and Homogenization Treatment
Using specially designed mixing equipment with precise control of mixing time and process parameters, we achieve nanoscale uniform distribution of powder components. This uniformity directly affects the stability and consistency of subsequent coating composition.
Degassing and Densification Key Technologies
Multistage degassing treatment in vacuum environments effectively reduces material oxygen content . Combined with advanced forming technologies like hot isostatic pressing (HIP) or hot press sintering, we obtain target products reaching 98% of theoretical density, significantly reducing particle splashing during sputtering.
Coating Performance Advantages of CrAl Sputtering Targets
Exceptional Coating Adhesion
Benefiting from the target’s high purity and low oxygen content, the prepared CrAlN coatings demonstrate excellent bonding strength with substrate materials, far exceeding conventional coating levels.
Improved Coating Surface Quality
Using our high-density targets, the number of large particles on deposited coating surfaces is reduced , significantly improving workpiece surface finish.
Enhanced Process Stability
Uniform target composition ensures stable sputtering processes, greatly improving consistency between production batches and reducing defect rates.
Our company uses powder metallurgy to prepare CrAl target materials, selecting more suitable Cr, Al, and CrAl alloy powders. These powders are mixed for sufficient time, fully degassed, and obtain CrAl target materials with low oxygen content, uniform composition distribution, and high density. This improves the adhesion of the deposited coating, reduces large particles during the deposition process, and makes the film performance more stable.
Typical CrAl Targets and Their Properties
|
ITEM |
Cr70Al at% |
Cr60Al at% |
Cr50Al at% |
|
Purity(%) |
99.8/99.9/99.95 |
99.8/99.9/99.95 |
99.8/99.9/99.95 |
|
Density（g/cm3） |
3.7 |
4.35 |
4.55 |
|
Grain Size(µm) |
100/50 |
100/50 |
100/50 |
|
Process |
HIP |
HIP |
HIP |
The chromium aluminum targets produced by the company are widely used in the field of tool and mold coatings. The targetsreact with nitrogen gas during the deposition process through arc, sputtering, and evaporation, which can form good superhard nitride coatings. Due to the high hardness and oxidation resistance of CrAlN coating at high temperatures, the machine tool can use high rotational speed and feed during cutting, thereby improving the cutting speed of the equipment and the surface quality of the workpiece.
We can also provide chromium aluminum alloy targets with different compositions . Please feel free to contact us for customization.
Post time: Sep-17-2025