Aluminum-silicon alloy target is an alloy material with aluminum and silicon as the main components, and the content ratio can be adjusted according to different application requirements. Aluminum-silicon sputtering target has good thermal conductivity, corrosion resistance, moderate strength and hardness. Various preparation methods, AlSi sputtering target is widely used in electronic packaging, LED lighting, photovoltaic, semiconductor integrated circuit and other fields.
Aluminum-silicon alloy thin film target possess the following characteristics:
1 AlSi alloy materials with high melting point: the aluminum-silicon alloy target generally has a high melting point, which makes it still able to maintain a relatively stable physical form in a high temperature environment, which is conducive to use in some high-temperature processing processes, such as some high-temperature coating processes in the manufacture of electronic components, to ensure that the target will not easily melt and deform.
2.Aluminum silicon metal alloy target with low density: Aluminum-silicon alloys themselves have a relatively low density, and the targets made from them are lightweight. This has obvious advantages in practical applications, especially in some equipment or devices where weight is a concern.
3.Aluminum base pvd target with good Electrical and Thermal Conductivity: The combination of aluminum and silicon gives the alloy targets good electrical and thermal conductivity. They can effectively conduct electric current and dissipate heat in applications such as electronic devices, which helps to improve the operating efficiency and stability of the equipment. For example, in semiconductor manufacturing, it is conducive to the heat dissipation of electronic components and the transmission of electrical signals.
4. Aluminum silicon sputtering target with corrosion resistance: A dense oxide film will form on the surface of aluminum-silicon alloy targets. This oxide film can prevent the internal metal from further reacting with substances such as air and water in the external environment, giving it good corrosion resistance. It is suitable for use in some relatively harsh chemical environments.
5.AlSi alloy magnetric sputtering target with chemical Stability: In general chemical environments, aluminum-silicon alloy targets have good chemical stability and are not prone to violent reactions with common chemical substances.
6.Aluminum Silicon alloy materials with high Strength and Hardness: By reasonably adjusting the composition ratio and production process of the aluminum-silicon alloy, the targets can have high strength and hardness. They can withstand certain external forces and friction. During the coating process, they are not prone to serious deformation or damage due to bombardment by ion beams and other factors, ensuring the service life of the targets and the quality of the coating.
7. Aluminum silicon planar sputtering targets with good Wear Resistance: Thanks to their high strength, hardness and other characteristics, aluminum-silicon alloy targets have good wear resistance. In practical use, they can resist the influence of various wear factors. For example, in some production lines that require long-term use of targets for coating, the frequency of target replacement due to wear can be reduced.
8.Aluminum silicon sputtering target materials with good Sputtering Performance: In physical vapor deposition and other coating processes, aluminum-silicon alloy targets have good sputtering performance. They can achieve high-efficiency sputtering at low sputtering power, enabling the uniform deposition of aluminum-silicon alloy particles on the substrate material to form a uniform and dense coating. They are widely used in the preparation of thin films in the optical, electronic and other fields.
9.Alloy target with controllable Composition: During the production process, the composition ratio of aluminum-silicon alloy targets can be precisely controlled. Thus, coatings with specific properties can be prepared according to different application requirements. For example, in the manufacturing of solar cells, the optoelectronic properties of the coating can be optimized by adjusting the ratio of aluminum to silicon in the target.
Aluminum-silicon alloys target can be produced either by melting or by powder metallurgy methods, The specific production method of the target material needs to be comprehensively evaluated based on the product’s purity, size, composition ratio and application scenarios.
Post time: Jan-22-2025