Technical consultant of RSM will share with you the advantages of cylindrical and planar magnetron sputtering targets? Compared with other magnetron sputtering targets, cylindrical and planar magnetron sputtering targets retain the advantages of good coating uniformity of rectangular planar targets, and can maximize the utilization of targets through the following two ways:
(1) When the two groups (four) of annular pits on the surface of the target reach a certain depth, the target core (magnet part) can be rotated 45 ° relative to the target tube, so that other areas on the target tube that have not been corroded can be used;
(2) When the target core of the cylindrical and planar magnetron sputtering target is designed as a rotating target core (the target core is rotating during sputtering), the surface of the target can be evenly sputtered off layer by layer without pits. At this time, the target will be used most effectively, and the utilization rate of the target can reach 50% ~ 60% When the target material is precious metal, this is obviously of great significance.
By using the principle of magnet with pole shoe in coaxial cylindrical magnetron sputtering target to solve the problem of end magnetic field, the rectangular plane target can be transformed into a cylindrical and planar magnetron sputtering target, The target can maximize the utilization rate of the target while keeping the good coating uniformity of the rectangular plane target So as to improve economic benefits.
Post time: Jul-04-2022