Uru na ọghọm dị na teknụzụ mkpuchi sputtering

N'oge na-adịbeghị anya, ọtụtụ ndị ọrụ ajụọla banyere uru na ọghọm dị na teknụzụ mkpuchi sputtering, Dị ka ihe ndị ahịa anyị chọrọ si dị, ugbu a ndị ọkachamara sitere na Ngalaba Teknụzụ RSM ga-eso anyị kerịta, na-atụ anya idozi nsogbu. O nwere ike ịbụ isi ihe ndị a:

　　1. magnetron sputtering enweghị nha nha

Na-eche na ndọta ikuku na-agafe n'ime na mpụta oghere magnetik nke magnetron sputtering cathode adịghị nhata, ọ bụ magnetron sputtering cathode na-enweghị isi. Ebe ndọta nke magnetron sputtering cathode nkịtị na-agbado n'akụkụ ebe a na-achọsi ike, ebe oghere ndọta nke magnetron sputtering cathode na-enweghị isi na-apụta na ebumnuche ya. Igwe ndọta nke magnetron cathode nkịtị na-egbochi plasma dị nso n'elu ebumnuche, ebe plasma dị nso na mkpụrụ ahụ adịghị ike nke ukwuu, ion na electrons siri ike agaghị agbaba mkpụrụ ahụ. Ebe magnetron cathode magnetik na-enweghị nha nha nwere ike ịgbatị plasma n'ebe dị anya site n'elu ebe a na-achọsi ike ma mikpuo mkpụrụ.

　　2. Mgbasa ozi ugboro redio (RF).

Ụkpụrụ nke itinye ihe nkiri mkpuchi mkpuchi: a na-etinye ikike na-adịghị mma na onye na-eduzi na-etinye n'azụ nke mkpuchi mkpuchi. N'ime plasma na-egbuke egbuke, mgbe efere ndu ion ziri ezi na-agba ọsọ ọsọ, ọ na-atụba ihe mgbochi dị n'ihu ya ka ọ gbasaa. Nke a sputtering nwere ike ịdịru naanị 10-7 sekọnd. Mgbe nke ahụ gasịrị, ikike dị mma nke a na-emepụta site na ụgwọ dị mma na-agbakọba na ihe mkpuchi mkpuchi na-eme ka ikike ọjọọ dị na efere onye na-eduzi, ya mere a na-akwụsị bọmbụ nke ions dị elu na-eme ka ọ dị elu. N'oge a, ọ bụrụ na polarity nke ọkọnọ ike na-atụgharị, electrons ga-atụ bọmbụ mkpuchi mkpuchi ma wepụ ụgwọ dị mma na efere mkpuchi n'ime 10-9 sekọnd, na-eme ka ọ ghara ịdị efu. N'oge a, ịtụgharị polarity nke ọkụ eletrik nwere ike ịmepụta sputtering maka 10-7 sekọnd.

Uru nke sputtering RF: ma ebumnuche ọla na ebumnuche dielectric nwere ike ịgbasa.

　　3, DC magnetron sputtering

Ngwa mkpuchi magnetron na-abawanye oghere magnet na DC sputtering cathode lekwasịrị anya, na-eji ike Lorentz nke magnetik iji kechie na ịgbatị trajectory nke electrons na mpaghara eletriki, na-abawanye ohere nke nkukota n'etiti electrons na gas atom, na-abawanye Ọnụego ionization nke gas atọm, na-abawanye ọnụ ọgụgụ nke ion ike dị elu na-atụ bọmbụ ebum n'obi ma na-ebelata ọnụ ọgụgụ nke electrons dị elu bombarding. nke plated mkpụrụ.

Uru nke planar magnetron sputtering:

1. The lekwasịrị ike njupụta nwere ike iru 12w / cm2;

2. Voltage e lekwasịrị anya nwere ike iru 600V;

3. Nrụgide gas nwere ike iru 0.5pa.

Ọdịmma nke planar magnetron sputtering: ebumnuche na-etolite ọwa sputtering na mpaghara runway, etching nke dum ebumnuche n'elu adịghị adabara, na itinye n'ọrụ nke ebumnuche bụ naanị 20% - 30%.

　　4, Intermediate ugboro AC magnetron sputtering

Ọ na-ezo aka na n'ime igwe ikuku magnetron AC na-ajụkarị, a na-ahazi ebumnuche abụọ nwere otu nha na ọdịdị n'akụkụ n'akụkụ, nke a na-akpọkarị ejima. A kwụsịtụrụ nrụnye ha. Ọtụtụ mgbe, a na-akwado ebumnuche abụọ n'otu oge. N'ime usoro nke AC magnetron reactive sputtering, ebumnuche abụọ ahụ na-eme ka anode na cathode n'aka ha, ha na-eme ka anode cathode ibe ha n'otu ọkara okirikiri. Mgbe ebumnobi dị na ike ọkara okirikiri na-adịghị mma, a na-atụba elu ebumnobi ma na-efesa ya site na ion dị mma; N'ime okirikiri nke ọkara dị mma, electrons nke plasma na-agbago n'elu ebumnuche iji mee ka ụgwọ dị mma agbakọbara n'elu mkpuchi mkpuchi nke elu ebumnuche, nke ọ bụghị naanị na-egbochi mgbanye nke elu ebumnuche, kamakwa na-ewepụ ihe omume nke " anode efu”.

Uru dị n'etiti ugboro abụọ ebumnuche reactive sputtering bụ:

(1) Ọnụ ego nkwụnye ego dị elu. Maka ebumnuche silicon, ọnụego nkwụnye ego nke ịgbasa sputter nke ọkara ugboro ugboro bụ okpukpu 10 karịa nke ịgbasa ọkụ DC;

(2) Enwere ike ime ka usoro mgbasa ozi guzosie ike na ebe arụ ọrụ setịpụrụ;

(3) A na-ewepụ ihe omume nke "mgbanye". Ngwongwo njupụta nke ihe nkiri mkpuchi mkpuchi a kwadebere bụ ọtụtụ iwu nke na-erughị nke usoro ịgbasa sputter nke DC;

(4) Ọnọdụ okpomọkụ dị elu dị elu bara uru iji meziwanye àgwà na adhesion nke ihe nkiri ahụ;

(5) Ọ bụrụ na ọkọnọ ike dị mfe iji dakọọ ebumnuche karịa ọkụ ọkụ RF.

　　5. Reactive magnetron sputtering

N'ime usoro mgbasa ozi, a na-enye gas mmeghachi omume ahụ ka ọ na-emeghachi omume na ihe ndị ahụ na-agbapụta iji mepụta ihe nkiri mejupụtara. Ọ nwere ike na-enye gas reactive iji meghachi omume na sputtering compound lekwasịrị n'otu oge, na ọ nwekwara ike na-enye reactive gas meghachi omume na sputtering metal ma ọ bụ alloy lekwasịrị n'otu oge na-akwadebe ngwakọta film na nyere kemịkal ratio.

Uru nke ihe nkiri ihe nkiri magnetron na-emeghachi omume:

(1) Ihe ndị e lekwasịrị anya na gas mmeghachi omume na-eji bụ oxygen, nitrogen, hydrocarbons, wdg, bụ ndị na-adịkarị mfe ịnweta ngwaahịa dị elu, nke na-eme ka nkwadebe nke ihe nkiri ihe nkiri dị elu dị ọcha;

(2) Site n'ịgbanwe usoro usoro, enwere ike ịkwadebe ihe nkiri kemịkalụ ma ọ bụ ihe na-abụghị nke kemịkal, nke mere na e nwere ike gbanwee àgwà nke ihe nkiri ahụ;

(3) The substrate okpomọkụ adịghị elu, na e nwere ole na ole mgbochi na mkpụrụ;

(4) Ọ bụ adabara nnukwu-mpaghara edo mkpuchi na-aghọta mmepụta mmepụta.

Na usoro nke reactive magnetron sputtering, enweghị ntụkwasị obi nke ogige sputtering dị mfe ime, tumadi gụnyere:

(1) Ọ na-esiri ike ịkwadebe ebumnuche ndị mejupụtara;

(2) Ihe omume nke arc na-egbu egbu (mwepu arc) kpatara site na nsi e lekwasịrị anya na enweghị ike nke usoro ịgbasa;

(3) Ọnụ ego nkwụnye ego dị ala;

(4) Ngwongwo njupụta nke ihe nkiri ahụ dị elu.